8e Colloque international sur les procédés plasma, 10-14 juin 1991, Antibes-Juan-Les-Pins, FranceLe Vide, les couches minces. 1991, Vol 47, Num 256, issn 0223-4335, SUPConference Proceedings

New trends in plasma etching and CVDHIROSE, M; SHIN, H; MIYAZAKI, S et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 105-112, issn 0223-4335, SUPConference Paper

Surface profile simulation of etching and deposition processesMCVITIE, J. P; REY, J. C; ISLAMRAJA, M. M et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 24-28, issn 0223-4335, SUPConference Paper

Optical analysis of a CF₄ magnetron dischargeHEINRICH, F; HOFFMANN, P; MÜLLER, K. P et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 12-14, issn 0223-4335, SUPConference Paper

Plasma etching of Ti in fluorine containing feedsD'AGOSTINO, R; FRACASSI, F; PACIFICO, C et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 152-154, issn 0223-4335, SUPConference Paper

Plasma processes : special valves for CVD and etchingSELE, G; BOISSIN, S.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 401-403, issn 0223-4335, SUPConference Paper

Plasmachemical etching of aluminium evaluated from the pressure variationsZAHORAN, M; KOSINAR, I; MARTISOVITS, V et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 316-318, issn 0223-4335, SUPConference Paper

Microelectronics detox systemsPROUST, N.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 65-72, issn 0223-4335, SUPConference Paper

Diamond, graphite, and amorphous carbon depositionBEULENS, J. J; BUURON, A. J. M; OTORBAEV, D et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 329-331, issn 0223-4335, SUPConference Paper

Auger analysis of plasma etched narow and deep trenchesSAGNOL, PH; HALLALI, P. E.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 289-291, issn 0223-4335, SUPConference Paper

The method of near anode plasma mass-spectrometryPOZHAROV, S. L; MIRKARIMOV, A. M.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 384-386, issn 0223-4335, SUPConference Paper

Vapodeposition of Si₃N₄ layers using a new PECVD reactorFAKIH, C; BES, R. S; ARMAS, B et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 335-337, issn 0223-4335, SUPConference Paper

Behaviour of polymer model surfaces in argon and oxygen plasmasSHI, M. K; HOLL, Y; CLOUET, F et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 250-252, issn 0223-4335, SUPConference Paper

Non-contact spacer and planarization control for CMOS technologyTEISSIER, J. F; ROTTINI, W; TISSIER, A et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 247-249, issn 0223-4335, SUPConference Paper

Plasma and surface characterization during reactive ion etching of tungstenPEIGNON, M. C; CARDINAUD, CH; TURBAN, G et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 295-297, issn 0223-4335, SUPConference Paper

Water vapour permeability and structure of plasma polymerized ethyleneTAKAHASHI, N; PELISSIER, V.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 356-358, issn 0223-4335, SUPConference Paper

Simulation of plasma processes with two-dimensional program TITANGERODOLLE, A; PELLETIER, J; TISSIER, A et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 283-285, issn 0223-4335, SUPConference Paper

A surface wave reactor of large diameter with localized ECR effectsANDRIES, B; SAADA, S; PARRENS, P et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 146-148, issn 0223-4335, SUPConference Paper

Application of EBIC and therma-wave for the characterization of RIE induced damageBAILEY, P. T; MOORE, R. A.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 116-118, issn 0223-4335, SUPConference Paper

Dry-etching monitoring of III-V heterostructures using laser reflectometry and optical emission spectroscopyCOLLOT, P; DIALLO, T.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 368-370, issn 0223-4335, SUPConference Paper

Numerical simulation of the effect of ion beam assistance on the structure and properties on thin C filmsANDRE, B; ROSSI, F.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 35-37, issn 0223-4335, SUPConference Paper

Properties of SiO₂ films prepared by PECVD in a O₂/SiH₄ or N₂O/SiH₄ microwave downstream dischargeDEL PUPPO, H; SINDZINGRE, T; PECCOUD, L et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 204-206, issn 0223-4335, SUPConference Paper

Transmetteur de mesure de pression partielle 600 A = Partial pressure measure transmitterMARTIN, B.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 390-392, issn 0223-4335, SUPConference Paper

Time resolved measurements of electron and negative ion densities for a pulsed RF CF₄ dischargeKONO, A; HAVERLAG, M; KROESEN, G. M. W et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 274-276, issn 0223-4335, SUPConference Paper

Optimisation d'un procédé de gravure isotrope du BPSG = Optimization of a BPSG isotrop etching processCLAUDE, R; PECCOUD, L; LASSAGNE, P et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 307-309, issn 0223-4335, SUPConference Paper